Stainless steel chamber spin coater for wafers up to 12"

Category: Equipment
Model: SPC12-C
SKU: mnd-5000-467
Price:

SPC12-C spin coater is with vacuum chuck designed for easy and quick coating via sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision motor, the maximum speed can reach 5000rpm, which effectively guarantees the uniformity of film formation. Besides, the instrument adopts touch screen control, can preset the coating curve, which greatly simplifies the process.

 

Application:

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Technical parameters:

Input power supply

  AC220V, 50Hz

Chamber material

  PP/Stainless steel (transparent acrylic upper cover)

Substrate size

  Diameter≤12 inches (~300mm)

Spin speed

  0-5000rpm

Acceleration

  100-5000rpm/s

Speed resolution

  1rpm

Single step time

  3000s

Operation method

  7 inches HD LCD touch screen

Dispensing method

  Manual dispensing

Coating curve

  Each curve has 5 segments, can store 5 curves in total

Vacuum chuck

  Yes, include

Vacuum pump

  Oil-less pump

Pumping speed

  50 L/min

Total weight

  ~40kg

 

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