![Stainless steel chamber spin coater for wafers up to 12"](/uploads/files/global/items/Perovskite/Equipment/5fb20be279fdc.jpg "Stainless steel chamber spin coater for wafers up to 12"")
![Stainless steel chamber spin coater for wafers up to 12"](/uploads/files/global/items/Perovskite/Equipment/5fb20bebb4b6b.jpeg "Stainless steel chamber spin coater for wafers up to 12"")
![Stainless steel chamber spin coater for wafers up to 12"](/uploads/files/global/items/Perovskite/Equipment/5fb20c023d668.jpeg "Stainless steel chamber spin coater for wafers up to 12"")
Stainless steel chamber spin coater for wafers up to 12"
SPC12-C spin coater is with vacuum chuck designed for easy and quick coating via sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision motor, the maximum speed can reach 5000rpm, which effectively guarantees the uniformity of film formation. Besides, the instrument adopts touch screen control, can preset the coating curve, which greatly simplifies the process.
Product Description
Application:
The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.
Technical parameters:
|
Input power supply |
AC220V, 50Hz |
|
Chamber material |
PP/Stainless steel (transparent acrylic upper cover) |
|
Substrate size |
Diameter≤12 inches (~300mm) |
|
Spin speed |
0-5000rpm |
|
Acceleration |
100-5000rpm/s |
|
Speed resolution |
1rpm |
|
Single step time |
3000s |
|
Operation method |
7 inches HD LCD touch screen |
|
Dispensing method |
Manual dispensing |
|
Coating curve |
Each curve has 5 segments, can store 5 curves in total |
|
Vacuum chuck |
Yes, include |
|
Vacuum pump |
Oil-less pump |
|
Pumping speed |
50 L/min |
|
Total weight |
~40kg |
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