Carbon nanotube array, multi-walled

Synonym: CNT array, MWCNT array
CAS Number: 308068-56-6
MDL number: MFCD00133992
Purity: >95% carbon basis (x'=ray)
Packing size: 25 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 2 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 10 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 25 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 EA  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 25 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 25 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 100 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 EA  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 5 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 250 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 5 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 25 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 EA  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 500 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 5 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 EA  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 EA  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 1 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 100 MG  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 2 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  
Purity: >95% carbon basis (x'=ray)
Packing size: 10 G  
Form: (1cm x 1cm Si wafer substrate, {100}, 300-550 μm thick, n-doped, resistivity 1-10 ohm-cm.)  



Safety Information


Hazard Statements

H373
H317
H351

Precautionary Statements

P202
P280
P308 + P313
P302 + P352
P272
P260

Pictograms