1200℃ single heating zone high vacuum CVD system with 3-channel mass flow meter O1200-50IT-3Z-HV
1200℃ single zone 3-channel gas supply high vacuum CVD system is equipped with a three-channel mass flowmeter, which has high precision and high reliability. It can accurately mix 1~3 channels of gas. The operation panel adopts digital display, which is intuitive and efficient. If you have special needs, you can contact the technician to customize any number of gas channels.
Product Description
The O1200-50IT, a 1200℃ single-heating-zone high vacuum chemical vapor deposition (CVD) system, emerges as an advanced solution tailored for precision and versatility in high-temperature applications. Its core component is a vacuum tube furnace crafted from high purity quartz material, featuring a standard tube diameter of 50mm and optional sizes of 60mm, 80mm, and 100mm. With a tube length extending to 800mm, the furnace chamber spans 440mm, housing a single heating zone that stretches 400mm and includes a constant temperature zone of 200mm.
The system prioritizes precise temperature control within a broad range of 0 to 1100℃, with an impressive accuracy of ±1℃. Temperature adjustments are seamlessly managed through a 30 or 50 segment program temperature control mode, with essential data conveniently displayed on an LCD interface. The vacuum tube furnace is equipped with a comprehensive control system, featuring PID temperature control, allowing users to edit a 30-segment raising and falling temperature program. Essential safety features, such as overheating and short circuit protection, further enhance the reliability of the system.
For an efficient vacuum environment, the system integrates a precision molecular pump set, achieving an impressive vacuum level of 1.0E-3Pa. This level of vacuum ensures a pure and controlled experimental environment, surpassing the capabilities of ordinary mechanical pumps. The entire system operates on a dependable AC power supply of 220V at 50/60Hz, maintaining a vacuum pressure of 4.4E-3Pa.
The gas supply system, designated as Model 3Z, features a 3-channel gas channel equipped with gas mass flow meters, catering to specific gases (H2, N2, Ar). Constructed from durable 304 stainless steel, the gas channel components, including connecting pipes and needle valves, adhere to standardized interface specifications with 1/4" ferrule connectors for both gas inlet and outlet.
Efficient exhaust is ensured through a combination of a molecular pump (600) and a rotary vane pump. The molecular pump achieves a notable pumping rate of 600L/S, enabling the system to reach a vacuum level of 1.0E-3Pa within 30 minutes. The rotary vane pump contributes with a pumping rate of 1.1L/S. The system is thoughtfully designed with KF40 connections for the pumping interface and KF16 connections for exhaust.
Vacuum measurement is achieved through a compound vacuum gauge, incorporating a resistance gauge with an ionization gauge, achieving an ultimate vacuum level of 1.0E-5Pa. The exhaust system's power supply aligns seamlessly with the primary system, operating at AC:220V 50/60Hz. The pumping interface is also equipped with a KF16 connection for integrated functionality. The applications of this CVD system extend to high-temperature sintering, metal annealing, quality inspection, and CVD experiments requiring diverse gas mixing atmospheres, making it a valuable asset in universities, research institutes, and industrial enterprises.
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