1200℃ single heating zone low vacuum CVD system with 3-channel mass flow meter O1200-50IT-3Z-LV
1200℃ single-heating zone low vacuum CVD system consists of a single heating zone tube furnace, a three-channel mass flow meter and a double stage rotary vane vacuum pump. The tube furnace is controlled by the precision temperature control instrument for PID temperature control.
Product Description
The O1200-50IT, a 1200℃ single-heating-zone low vacuum chemical vapor deposition (CVD) system, stands as a versatile and precision-engineered solution for high-temperature applications. Featuring a vacuum tube furnace crafted from high purity quartz material, the system offers adaptability in tube diameters, providing a standard size of 50mm and optional choices including 60mm, 80mm, and 100mm. The tube extends to a length of 800mm, enveloping a furnace chamber measuring 440mm, housing a single heating zone spanning 400mm, complemented by a constant temperature zone of 200mm.
Temperature control is a highlight, with the system ensuring remarkable precision within a broad range of 0 to 1100℃, maintaining an accuracy level of ±1℃. Users can choose between two temperature control modes, opting for either a 30 or 50 segment program temperature control, with all pertinent information displayed on an intuitive LCD interface. A robust 304 stainless steel vacuum flange provides a reliable sealing mechanism, and the flange interfaces come in versatile options of 1/4" ferrule connectors and KF16/25/40 joints.
Operating effectively within a vacuum environment rated at 4.4E-3Pa, the system is powered by a dependable AC supply of 220V at 50/60Hz. The gas supply system, designated as Model 3Z, features a 3-channel gas channel equipped with gas mass flow meters. Gas flow measuring ranges cover the A channel (0-100SCCM H2 gas), B channel (0-300SCCM N2 gas), and C channel (0-500SCCM Ar gas), boasting an impressive measurement accuracy of ±1.0%F.S. Components, including connecting pipes and needle valves, are constructed from robust 304 stainless steel, featuring interface specifications of 1/4" ferrule connectors for both gas inlet and outlet.
Efficient exhaust is achieved through a combination of a mechanical pump and a rotary vane pump, with the mechanical pump delivering a notable pumping rate of 1.1L/S. Exhaust interfaces are thoughtfully designed with KF16 connections. Vacuum measurement relies on a resistance gauge, allowing the system to attain an ultimate vacuum level of 1.0E-1Pa. The power supply for the exhaust system aligns seamlessly with the primary system, operating at AC:220V 50/60Hz, with the pumping interface also equipped with a KF16 connection for seamless integration.
The applications of this CVD system are diverse, spanning high-temperature sintering, metal annealing, quality inspection, and CVD experiments requiring varied gas mixing atmospheres. Its user-friendly design, advanced features, and robust construction make it an indispensable tool in universities, research institutes, and industrial enterprises, enhancing experiment efficiency and precision.
Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.