1200℃ three heating zone low vacuum CVD system with 3-channel mass flow meter O1200-50IIIT-3Z-LV
1200℃ three heating zone low vacuum CVD system is equipped with three-channel mass flowmeter, which has high precision and high reliability. It can accurately mix 1~3 channels of gas. The operation panel adopts digital display, which is intuitive and efficient. If you have special needs, you can contact the technician to customize any number of gas channels.
Product Description
The Model O1200-50IIIT, a 1200℃ three-heating-zone low vacuum chemical vapor deposition (CVD) system, is a versatile solution designed for high-temperature applications across various industries. This system comprises a three-heating-zone tube furnace, a three-channel mass flow meter, and a double-stage rotary vane vacuum pump, providing users with precise control over their experimental conditions.
The vacuum tube furnace, crafted from high-purity quartz material, accommodates tube diameters of 50mm (with optional sizes of 60mm, 80mm, and 100mm) and boasts a tube length of 1300mm. With a furnace chamber extending to 1060mm, the three heating zones, each spanning 300mm, allow for tailored temperature control. The system excels in maintaining a temperature range of 0 to 1100℃ with an impressive accuracy of ±1℃. The temperature control options include 30 or 50 segment program temperature control modes, displayed on a user-friendly LCD interface.
Operational convenience is further enhanced by a high-definition true-color touch screen, making the system accessible even to non-professionals with minimal training. The furnace tube features flanges on both sides equipped with a digital vacuum gauge and a mechanical pressure gauge, enabling precise control over the atmosphere within the tube.
Designated as Model O1200-50IIIT, this CVD system operates efficiently at a vacuum pressure of 4.4E-3Pa and is powered by an AC supply of 220V at 50/60Hz. The gas supply system, labeled Model 3Z, integrates a 3-channel gas channel equipped with gas mass flow meters, catering to specific gases (H2, N2, Ar). Structural components of the gas channel, including the connecting pipe and needle valve, are constructed from durable 304 stainless steel. The gas flow measuring ranges for each channel are precisely controlled, ensuring a measurement accuracy of ±1.0%F.S. The exhaust system combines a mechanical pump and a rotary vane pump, with a pumping rate reaching 1.1L/S. The exhaust interfaces feature KF16 connections for efficient vacuum performance, and the system employs a resistance gauge for vacuum measurement, achieving an ultimate vacuum level of 1.0E-1Pa.
This CVD system's applications span high-temperature sintering, metal annealing, quality inspection, and CVD experiments that demand diverse gas mixing atmospheres. Its robust design, coupled with advanced features, positions it as a reliable tool for enhancing experiment efficiency in universities, research institutes, and industrial and mining enterprises.
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