1200℃ two heating zone high vacuum CVD system with 3-channel float flow meter to supply gas O1200-50IIT-3F-HV
1200℃ two heating zone high vacuum CVD system is equipped with a three-channel float flowmeter, which can accurately prepare the mixed gas required for the experiment. Another pressure gauge is installed on the front of the float flowmeter to monitor the gas pressure and the mixing tank pressure.
Product Description
The 1200℃ two-heating-zone high vacuum chemical vapor deposition (CVD) system, identified as Model O1200-50IIT, integrates cutting-edge technology for versatile applications across various industries. Comprising a vacuum tube furnace crafted from high-purity quartz, the system provides users with customization options for tube diameters (50mm, 60mm, 80mm, or 100mm) while maintaining a standard tube length of 1000mm. The furnace chamber, extending over 440mm, features two independently temperature-controlled heating zones, each covering 200mm. Offering precise temperature control within the 0 to 1100℃ range with an accuracy of ±1℃, the system allows flexibility through a 30 or 50 segment program temperature control mode displayed on an intuitive LCD interface.
Ensuring sealing integrity, the system employs a 304 stainless steel vacuum flange with 1/4" ferrule connectors and KF16/25/40 joints. Operating under a vacuum level of 4.4E-3Pa, the system is powered by AC:220V 50/60Hz, catering to the specific power requirements. The gas supply system, Model 3F, incorporates a 3-channel gas channel equipped with gas float flow meters for accurate flow measurements. Covering a comprehensive range, the gas flow measuring channels include A (0-100ml H2 gas), B (16-160ml N2 gas), and C (25-250ml Ar gas) with a measurement accuracy of ±2.0%. Designed for durability and corrosion resistance, the gas channel components are constructed from 304 stainless steel, including the needle valve, utilizing 1/4" cutting sleeve joints for gas inlet and outlet.
The exhaust system, identified as Model GZK103-B, boasts a molecular pump (600) and a rotary vane pump, ensuring efficient gas evacuation. The molecular pump achieves a pumping rate of 600L/S, enabling the system to reach a vacuum level of 1.0E-3Pa within 30 minutes. The rotary vane pump, operating at 1.1L/S, is equipped with KF40 and KF16 interfaces for pumping and exhaust, respectively. Vacuum measurement is executed using a compound vacuum gauge, combining a resistance gauge and an ionization gauge, achieving an ultimate vacuum level of 1.0E-5Pa. The power supply for the exhaust system aligns with the primary system, operating at AC:220V 50/60Hz, ensuring seamless coordination for optimal performance. This meticulously engineered CVD system is well-suited for high-temperature sintering, metal annealing, quality inspection, and CVD experiments requiring precise gas mixing atmospheres, making it an invaluable tool for universities, research institutes, and industrial enterprises.
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