2" DC Plasma Magnetron Sputtering Coater for Conductive Thin Films

SKU: MND-134030
Model: MSP300S-DC

This Magnetron Sputtering Coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. Its compactness and ease of operation make it an ideal coating system for use in R&D labs.

 Product Description

MSP300S-DC is a compact magnetron sputtering coater with one 2" target sources. DC source for coating metallic material. A film thickness tracker is included to enable the user to control processing easily. This Magnetron Sputtering Coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. Its compactness and ease of operation make it an ideal coating system for use in R&D labs The magnetron sputtering coater is equipped with a range of technical parameters to ensure efficient operation. It operates on a 220VAC power supply at 50/60Hz, single-phase, with a total power consumption of 2000W, which includes the pump. The power source is customizable, with the option of one RF power source and a 500W DC source specifically designed for coating metallic materials. The coater features a single 2" Magnetron Sputtering Head with water cooling jackets, allowing for connection to the optional power source. Water cooling for the head requires a flow rate of 10ml/min. The vacuum chamber, constructed from high purity quartz, measures 300mm in diameter and 300mm in height, providing an ideal environment for sputtering processes. The sample holder accommodates samples with a size of 185mm and offers adjustable rotation speeds ranging from 1 to 20rpm. It also allows for precise temperature control, with a temperature range from room temperature (RT) to a maximum of 500℃, maintaining an accuracy of +/- 1.0℃. The vacuum pump station is equipped with a high-speed turbo vacuum pump system directly installed on the vacuum chamber, ensuring a maximum vacuum level. Additionally, a heavy-duty dual-stage mechanical pump is connected to the turbo pump for faster pump speed. A mobile pump station is included, and the compact sputtering coater can be placed on top of the station. The maximum vacuum level achieved is 10^-6 torr, with chamber baking capability. For coating thickness monitoring, a precision quartz thickness sensor is integrated into the chamber, providing accuracy down to 0.10 Å. An LED Display Unit outside the chamber allows for input of coating material data, displays the total thickness coated, and indicates coating speed. The system includes five quartz sensors (consumable) and requires water cooling. The coater comes with a one-year limited warranty and lifetime support, ensuring the reliability of the equipment. These detailed technical specifications collectively define the capabilities and features of the magnetron sputtering coater, offering valuable insight into its performance and functionality.