600-3HD Three-target magnetron sputtering coater
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials.
Product Description
Introducing the 600-3HD three-target magnetron sputtering coater, a cutting-edge coating equipment designed for the versatile preparation of material films. This newly developed coater demonstrates broad applicability, catering to the creation of monolayer or multi-layer films, including ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, and polytetrafluoroethylene films. Its compact size and user-friendly operation make it an ideal choice for laboratory material film preparation, particularly suitable for research on solid electrolytes and OLEDs.
Operating under specific installation conditions, this coater thrives at altitudes of 1000m or lower, temperatures within the range of 25℃±15℃, and a humidity level of 55% Rh ± 10% Rh. It requires essential components such as a self-circulating chiller for water, AC220V 50Hz electricity with a reliable ground connection, and 99.99% or higher purity argon gas for chamber filling. The equipment must be positioned on a robust workbench capable of bearing over 200kg, including a ventilation device.
Key features of the 600-3HD coater include three target guns, offering flexibility with RF coating power supply for non-conductive targets and DC power supply for conductive materials. The modular design allows customization, separating the vacuum chamber, vacuum pump set, and control power supply to meet user requirements. Users can choose power supply configurations based on their needs, enabling control of multiple target guns with one power supply or controlling one target gun with multiple power sources. This coater's versatility makes it suitable for various applications, maintaining a compact size and ease of operation.
Technical parameters include a power supply voltage of 220V 50Hz with a total power of 2.5W (excluding the vacuum pump), a working vacuum degree of 10⁻⁴Pa, and a working temperature range from room temperature to 500℃ with an accuracy of ±1℃. The coater includes three target guns with water cooling, accepting target sizes of Ø2’’ with thicknesses ranging from 0.1mm to 5mm. Optional power configurations include DC sputtering power of 500W and RF sputtering power of 300W or 500W. The loading sample table accommodates Ø140mm samples with adjustable rotation speeds within the range of 1rpm to 20rpm. Protective gas, including inert gases such as Ar and N2, is controlled by a mass flow meter with 2 channels, featuring flow rates of 100 SCCM and 200 SCCM.
The main unit specifications measure 500mm×560mm×660mm, while the entire machine's size is 1300mm×660mm×1200mm, with a weight of 160kg. Standard accessories provided with the coater include a DC power control system, RF power control system, film thickness monitor system, molecular pump, chiller, cooling water pipes (Ø6mm), and various targets such as gold, indium, silver, and platinum.
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