Compact powder PVD coating system
Compact powder PVD coating system consists of 2" water cold magnetron sputtering head and vibration stage. The particles will jump on the vibration stage during coating and form a core-shell structure. The coater will be useful for preparing special powder for 3D printing and solid state electrolyte powders.
Product Description
The Compact Powder PVD Coating System is a specialized device designed for precision surface coating of powder materials, employing a 2-inch magnetron sputtering head and a vibrating sample stage. This innovative system ensures uniform coating on powder surfaces, creating a distinctive core-shell structure. The vibrating sample table allows for the dynamic movement of the powder during sputtering, ensuring even and thorough coverage. This glove-box-compatible system is particularly well-suited for handling sensitive materials.
Distinguished by its versatility, the Compact Powder PVD Coating System accommodates various coating needs. DC magnetron sputtering is employed for metallic materials on powder surfaces, while RF magnetron sputtering is suitable for coating non-metallic materials or carbon on material surfaces. Technical parameters include an input voltage of 220 VAC at 50/60Hz, delivering a power output of 1600 VDC and 250 W. The system can handle a maximum current of 150 mA and features a 2-inch angle-adjustable sputtering head. The vibrating sample stage allows for adjustable frequency between 6-33Hz, with a recommended sample weight of less than 500 mg and particle sizes ranging from 1 to 1000μm.
The quartz chamber dimensions measure 165 mm OD, 150 mm ID, and 250 mm in height, offering two vacuum options. With a mechanical pump, it achieves a vacuum degree of 1.0E-2 Torr, suitable for sputtering materials like Au, Ag, Pt, Cu, and Mo. Alternatively, employing a molecular pump achieves a vacuum degree of 1.0E-5 Torr, enabling the sputtering of easily oxidized metals such as Al, Mg, Li, Lr, Ti, and Zn. Extended pumping time and chamber baking can attain a maximum vacuum of < 4.0E-6 Torr. The system holds CE certification, ensuring adherence to safety and quality standards.
Product specifications highlight dimensions of L460 × W330 × H810mm and a net weight of 20Kg. Safety precautions are emphasized, recommending the use of protective gloves during sputtering head operation and stressing the importance of thorough cleaning of targets, sputter heads, substrates, and sample stages before each use. Special attention is given to Al or Ni targets, requiring cleaning and treatment before operation. Additionally, optimal system performance requires thorough drying and dispersion of powder samples.
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