Desktop double head magnetron sputtering coating machine
This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory.
Product Description
Introducing our advanced Double Target Magnetron Sputter Coater, designed with precision and efficiency in mind. This cutting-edge equipment boasts a high-vacuum stainless steel chamber with a front door opening and a convenient quartz observation window, facilitating easy observation and recording of experiments. Enhancing film uniformity and quality, the coater features a rotary heating sample table, while a set of baffle plates on the top cover allows seamless switching between two targets for multilayer coating.
This coater is optimized for use with a high-vacuum molecular pump group, offering users the flexibility to choose an imported brand small molecular pump for space-saving installation. Additionally, the model can be equipped with film thickness meter components, enabling real-time monitoring of film thickness and providing reliable parameters for experimental processes.
The technical specifications of the Double Target Magnetron Sputter Coater are extensive. With a sample stage measuring 100mm and the ability to heat samples up to 500℃ with precise temperature control, this coater ensures optimal conditions for experimentation. The sample stage's adjustable rotation speed, ranging from 1 to 20 revolutions per minute, further contributes to the uniformity of film deposition. The sputter head accommodates two 2-inch sputtering targets and operates efficiently with a water-cooling system.
The vacuum chamber, constructed from SUS (Stainless Steel), has dimensions of Dia 210mm x 260mm and incorporates a φ40mm watch window. The front-opening design enhances accessibility. The coater is powered by a DC power supply with a maximum output power of ≤300W and an output voltage of ≤600V, featuring a rapid response time of less than 5 milliseconds. Cooling is facilitated by a water cooling system with a 9L tank capacity and a flow rate of 10 L/min, ensuring optimal performance.
Accurate film thickness measurements, up to 0.1 angstroms, add to the precision of this coater. The power supply requirement is AC220V at 50Hz, with a total power consumption of 4kW. The molecular pump system includes a backing pump with a capacity of 1.1L/s, a rotary vane pump, and a secondary pump with a pumping capacity of 600L/s, utilizing a domestic turbo molecular pump. Extraction and air outlet interfaces are KF40 and KF16, respectively. These specifications provide a comprehensive overview of the Double Target Magnetron Sputter Coater's features and capabilities.
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