Dual-target DC magnetron sputtering coater
Dual-target DC magnetron sputtering coater can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory
Product Description
The Dual-target DC magnetron sputtering coater stands as a testament to our commitment to innovation, offering a cost-effective and customizable solution for precise thin-film deposition. This standardized and modular coating equipment, independently developed by our company, presents users with the choice of 1-inch or 2-inch magnetron targets, catering to diverse substrate sizes. The inclusion of two 500W DC power supplies empowers users to efficiently prepare metal films, meeting the demands of multi-layer or multiple coatings. The coater is designed with flexibility in mind, featuring a two-channel high-precision mass flowmeter that can be customized to a four-channel configuration to accommodate complex gas environments.
This instrument is equipped with advanced turbomolecular pump sets, achieving an ultimate vacuum of up to 1.0E-5Pa. The molecular pump gas path is intelligently controlled by multiple solenoid valves, allowing users to open the chamber for sample retrieval without interrupting the pump operation, significantly improving workflow efficiency. The top-notch design of this coater facilitates easy target replacement through its top-opening vacuum chamber, streamlining operational processes. Real-time observation is facilitated by a φ100mm watch window. Two magnetron sputtering heads, each featuring a water-cooled interlayer, are seamlessly connected to the DC power supplies, ensuring reliable and controlled sputtering performance.
The sample stage accommodates substrates up to 4 inches in diameter, providing adjustable rotational speeds from 1 to 20 rpm. The sample carrier boasts a maximum heating temperature of 500℃ with precise temperature control accuracy within +/- 1.0 °C. Efficient gas flow control is achieved through the two installed mass flow meters with a range of 0-200sccm. The coater is equipped with a molecular pump system, featuring one-button operation and a pumping speed of 80L/S for efficient vacuum processing. The cooling system, operating at a rate of 16L/min, ensures consistent temperature control. Operating seamlessly on a voltage of 220V and a frequency of 50Hz, the Dual-target DC magnetron sputtering coater offers a robust and reliable solution for a myriad of thin-film deposition applications.
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