Dual target magnetron sputtering and thermal evaporation composite coating machine

The PVD coating equipment, model MSE325S-2TA1S, is a sophisticated system crafted for precise material deposition processes. Comprising a stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system, and control system, it offers a comprehensive solution for advanced research and development. The intuitive touch screen operation, coupled with temperature control meter detection, creates a user-friendly interface for seamless digital parameter input and automatic operation, establishing an exceptional platform for research endeavors.
 

The vacuum chamber, constructed from 304 stainless steel, boasts an elegant design with an observation window and baffle, ensuring impeccable workmanship and optimal vacuum performance. The main sealing flange, featuring CF series high vacuum sealing, guarantees airtight integrity through rubber seal rings at each vacuum chamber interface. Placing emphasis on uniform coating effects, the target is strategically positioned at the cavity's bottom, utilizing an upward-facing configuration, while the heating and rotating capabilities of the sample table further enhance coating uniformity.
 

The equipment adopts a dual-stage vacuum pump system, integrating a mechanical pump as the backing pump for swift transition from atmospheric pressure to low vacuum. The primary pump utilizes a turbine molecular pump, known for its high pumping speed and rapid vacuum acquisition. The overall vacuum system is characterized by efficiency, cleanliness, and speed. Model MSE325S-2TA1S embodies specific technical parameters, featuring a 150mm diameter sample table with precise temperature control up to 500℃ and variable rotation speeds from 1 to 20 revolutions per minute. Equipped with two 2-inch magnetron sputter heads and a water-cooled cooling mechanism, the equipment utilizes a tungsten wire basket as the thermal evaporation source with a maximum temperature capacity of 1500℃.
 

The vacuum chamber dimensions, measuring 325mm in diameter and 350mm in height, ensure accessibility through a front-opening door and a 100mm diameter watch window. The vacuum system comprises a mechanical pump with a rotary vane pump, achieving a pumping rate of 1.1L/s, and a turbo molecular pump with a CF150 extraction interface, reaching a pumping rate of 600L/s. Vacuum measurement employs a resistance gauge and an ionization gauge, achieving an ultimate vacuum degree of 1.3x10-4Pa. Power supplies include an AC220V, 50/60Hz input, a DC power supply with an output power of ≤1000W, and an RF power supply with a frequency of 13.56MHz and power stability of ≤5W.
 

Additional features encompass a film thickness gauge with precise measurements, a water-cooled system with a 9L tank volume and a 10L/min flow rate, and a gas system utilizing argon gas through a mass flow meter (MFC) with a flow range of 200sccm. The equipment's overall dimensions are 1400x750x1300mm, with a total power consumption of 4kW, inclusive of the host and vacuum pump, and a weight of 295kg. This comprehensive PVD coating equipment stands as a pinnacle of technological sophistication for diverse scientific and industrial applications.

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