Dual target magnetron sputtering coater with reciprocating sample stage
MSP500S-DCRF-RE is a laboratory magnetron sputtering coater with two target positions developed by our company. this magnetron sputtering coater is equipped with a DC power supply and a RF power supply, which can be used to prepare single or multilayer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Product Description
The MSP500S-DCRF-RE magnetron sputtering coater stands out as a pinnacle of efficiency and precision in film preparation for laboratory applications. Distinguished by its unique features, this coater employs magnetron sputtering, offering advantages such as high energy and speed, a rapid coating rate, and low sample temperature rise—characteristics defining it as a high-speed, low-temperature sputtering solution compared to ordinary plasma sputtering.
The magnetron sputter target is equipped with a water-cooled interlayer, ensuring stable, long-term operation by efficiently dissipating heat and preventing accumulation on the target surface. The sample stage is ingeniously designed with a reciprocating mechanism, complemented by a magnetic coupling push rod for versatile left and right movement, enhancing flexibility in sample handling. The entire coater is controlled through an intuitive touch screen interface, featuring a built-in one-button coating program for ease of operation, making it an ideal choice for laboratory film preparation.
Model MSP500S-DCRF-RE operates on AC220V at 50Hz, consuming 6KW of power, and achieves an impressive ultimate vacuum degree of 5x10-4Pa. The φ500mm diameter, 490mm height vacuum chamber is constructed from robust stainless steel, incorporating a φ100mm watch window for observation and a convenient front-opening door for accessibility. The sample table, with a surface area of 100mm x 100mm and a reciprocating stroke of 200mm, provides versatile sample placement and movement options. The magnetron sputtering head boasts two sets of 2-inch targets and utilizes an efficient water-cooling system with a required flow rate of 10L/min, complemented by a dedicated water chiller for optimal temperature control. Gas flow is precisely controlled using a one-channel gas flow controller with a 200sccm capacity for argon (Ar) gas.
The vacuum pump system integrates a high-capacity molecular pump with a pumping rate of 600L/S, ensuring efficient vacuum conditions. Film thickness measurements are conducted using a quartz vibrating film thickness gauge with a remarkable resolution of 0.10 Å. Dual power supplies include a 500W DC power supply for metal film deposition and a 500W RF power supply for non-metallic coating. All operations are monitored through an all-in-one computer interface. The coater's overall dimensions measure 1090mm x 900mm x 1250mm, with a total weight of 350kg, embodying a comprehensive set of technical specifications that highlight its advanced capabilities.
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