Film thickness monitor MDC5V
Film Thickness Monitor – Precision Control for Thin Film Deposition
Our advanced film thickness monitor offers reliable, real-time measurement for thin film processes, ensuring high accuracy and stability across various deposition environments. Compact and efficient, it is ideal for integration into vacuum systems, PVD/ALD tools, and other coating equipment.
Product Description
Key Features:
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Power Supply: Operates on DC 5V (±10%) with a maximum current draw of 400mA.
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High Frequency Resolution: ±0.03Hz, allowing sensitive detection of film growth.
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Exceptional Thickness Resolution: 0.0136 Å (for aluminum), enabling sub-angstrom precision.
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Measurement Accuracy: ±0.5%, influenced by process conditions such as sensor placement, material stress, temperature, and density.
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Adjustable Measurement Speed: Ranging from 100ms to 1s per reading.
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Wide Measuring Range: Capable of measuring up to 500,000 Å (for aluminum films).
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Standard Sensor Crystal: 6 MHz quartz crystal included.
Environmental Specifications:
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Operating Temperature: 0–50°C
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Humidity Tolerance: 5%–85% RH, non-condensing
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Compact Dimensions: 90mm × 50mm × 18mm
Probe & Installation Details:
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Compatible Chip Frequency: 6 MHz
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Wafer Size Supported: Φ14 mm
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Mounting Flange: CF35 standard
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Cooling Water Tubing: Φ3 mm, available in 300 mm, 500 mm, or 1000 mm lengths
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Cooling Water Pressure: <0.3 MPa
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Pneumatic Shutter Tubing: Φ3 mm
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Bake-Out Limits:
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With water flow: <200°C
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Without water flow: Flange temperature must be kept below the limit
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Designed for demanding thin-film applications, this monitor combines speed, precision, and versatility—making it a reliable choice for both research and industrial environments.