MPCVD grown diamond deposition equipment

The Microwave Plasma Chemical Vapor Deposition (MPCVD) system offers a versatile platform for applications such as the preparation of high-quality single crystal diamond, polycrystalline free-standing diamond films, and various carbon nano films like graphene, carbon nanotubes, fullerenes, and diamond films. Its innovative features include a robust stainless steel cavity-type 6kW microwave plasma equipment with high power density, ensuring efficient performance. The water-cooled substrate stage and metal chamber contribute to the system's prolonged stability. Substrate temperature is achieved through microwave plasma self-heating, and the system incorporates a full-range vacuum gauge for precise pressure measurements.
 

The vacuum system, featuring a turbo molecular pump and a rotary vane mechanical vacuum pump, ensures optimal vacuum conditions. The cooling water circulation system maintains long-term stability under high power. The system is equipped with a 15-inch touch screen, PLC automatic control, and the ability to set and save up to 20 process files. The fully automated process control module ensures the reliable preparation of high-quality diamond films and crystals.
 

Installation requirements include specific conditions for gas connection, power supply, cooling water, compressed air, and exhaust channels, all provided by the customer. Rigorous pre-acceptance checks guarantee the system's vacuum and microwave leakage, water pipe integrity, and overall functionality.

The technical specifications highlight the system's key components, including a Sairem microwave source, operating frequency, power adjustment range, and innovative features like the 3-stub tuner and mode conversion antenna. The vacuum system parameters, pressure range, and the double-layer water-cooled stainless steel reactor construction are detailed. The substrate stage, gas channel, temperature measurement system, control interface, and automatic protection features underscore the system's precision, user-friendly operation, and safety protocols, making it an advanced solution for varied deposition applications.


Disclaimer: The information presented on this website, including product images, product descriptions, and technical parameters, serves as a reference guide. Please note that due to potential delays in updates, discrepancies may exist between the content displayed here and the current product status. We encourage you to reach out to our dedicated sales team to verify the most up-to-date details. It is important to understand that the information provided on this site does not constitute a formal offer or commitment, and our company reserves the right to periodically enhance and amend website information without prior notice. We appreciate your understanding in this regard.