RTP rapid annealing furnace O1000-120I-T-RTP
RTP rapid annealing furnace is a powerful heating equipment independently developed by our company. The RTP rapid annealing furnace is heated by imported infrared heating tube. The shape is novel and the structure is reasonable. The furnace body and the furnace tube can slide freely, which can realize rapid temperature rise and fall.
Product Description
The tube size of the RTP rapid annealing furnace is 120mm, which can directly place 4 inches of material. The reaction zone of the sample is in a closed quartz chamber, which greatly reduces the possibility of indirect contamination of the sample while completing the production process. The device is equipped with LCD high-definition touch screen, and the setting data experiment operation is all graphic interface. It is convenient and quick to operate, which can greatly improve your experiment efficiency. The equipment has reserved the quick interface for vacuum and air gases, and our vacuum system can be used together with the gas mixing system. RTP rapid annealing furnace application range: Rapid annealing furnace equipment can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicidation, diffusion, compound semiconductor annealing, post-ion implantation annealing, electrode alloying, crystallization and densification, alloy melting point analysis, thin film deposition, and the like. The RTP (Rapid Thermal Processing) annealing furnace, designated as Model O1000-120I-T-RTP, boasts a range of precise technical specifications. The furnace tube is composed of high-purity quartz, featuring a substantial diameter of 120mm and a tube length of 500mm. Within the furnace chamber, which extends to a length of 440mm, there exists a heating zone measuring 400mm, inclusive of a 200mm constant temperature zone. The furnace exhibits an operating temperature range from 0 to 500℃, offering versatility in thermal processing. The heating process is optimized for rapid annealing, with a recommended heating rate of 80℃/s, allowing for fast thermal transitions at rates of up to 200℃/s. In terms of cooling, the furnace ensures effective cooling to more than 200℃ within 25 minutes. Temperature control is maintained with high precision, achieving an accuracy of ±1℃. Temperature regulation is implemented using a 30 or 50 segment program temperature control system. Monitoring and control of the annealing process are facilitated by an LCD touch screen display. The furnace is sealed with a 304 stainless steel vacuum flange, and the flange interface is designed to accommodate a 1/4" ferrule connector (Ø8 pagoda-shape connector). Operating under a vacuum level of 4.4E-3Pa, the furnace is compatible with a power supply of AC:220V at 50/60Hz. These technical parameters establish the RTP rapid annealing furnace as a reliable and efficient tool for a range of thermal processing applications, particularly those necessitating precise temperature control and rapid thermal transitions.