Single crystal growth furnace with four electrodes Arc melting up to 3000℃
MSM-4CZ is a single crystal growth furnace with four gun arc melting in the vacuum chamber (Ar gas arc is used to melt the sample and the pulling and rotation mechanism is used for pulling). Its temperature can reach 3000℃. The chamber is made of 304 stainless steel (with the water cooling jacket), and the vacuum can reach 1.0E-5Torr. This single crystal furnace is particularly suitable for growing high-melting single crystals, such as Ti single crystal, YSZ, SiC and CeRh2Si, etc.
Product Description
Our single crystal growth furnace represents a pinnacle in advanced materials processing, featuring a robust vacuum chamber constructed from 304 stainless steel. The chamber incorporates a water cooling jacket for efficient cooling, with the capability to introduce cooling water. Offering a clear view of the sample, the chamber is designed with a quartz window, and its size measures dia.257 * 360mm. Operating at an impressive vacuum level of 1.0E-5 Torr, the molecular pump system ensures precise control and stability during crystal growth.
Equipped with four arc guns, each featuring cooling water for temperature uniformity, the furnace provides flexibility in adjusting the angle and distance between the tungsten electrode arc chamber and the sample manually. The tungsten electrodes, each with a diameter of Φ4mm, generate a striking power supply operating at 18V and a current of 185A, achieving a melting temperature of up to 3000℃. The water-cooled copper crucible, serving as the sample stage, accommodates up to 60g (Fe based) of the sample.
Controlled by a sophisticated controller, the pulling mechanism allows for adjustments in pulling speed, pulling stroke, and pulling rod rotation speed. With a pulling speed ranging from 0.2 to 10mm/h and a pulling stroke of up to 70mm, the system provides precise control over crystal growth parameters. The rotation speed of the pulling rod can be set between 0 and 40RPM, offering further customization.
Ensuring optimal conditions for crystal growth, the equipment is complemented by a molecular pump system with a pumping rate of 100L/S, achieving a vacuum of 1.0E-5 Torr within 40 minutes. A circulating water chiller, with a power of 800W, a water flow speed of 58L/min, and a cooling capacity of 5004W (17500 Btu/hour), maintains precise operating temperatures ranging from 5 to 30℃. With overall dimensions of 800mm (L) * 800mm (W) * 1500mm (H), our single crystal growth furnace offers a comprehensive solution for cutting-edge materials research and development.
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