Tetrakis(dimethylamido)titanium(IV) / 25 G
Safety Information
Hazard Statements
Precautionary Statements
Pictograms
Properties
| Signal Word | Danger |
| Flash Point (C) | -30 °C - closed cup |
| Flash Point (F) | -22.0 °F - closed cup |
| Density | 0.947 g/mL at 25 °C (lit.) |
| Boiling Point | 50 °C/0.5 mmHg (lit.) |
Product Description
TETRAKIS(DIMETHYLAMIDO)TITANIUM(IV) is a titanium compound used as a precursor in chemical vapor deposition (CVD) processes. It is notable for its role in producing high-purity titanium nitride and titanium dioxide thin films.
Application:
TETRAKIS(DIMETHYLAMIDO)TITANIUM(IV) is utilized in the deposition of titanium nitride and titanium dioxide coatings, commonly applied in semiconductor manufacturing and surface protection technologies.
Articles:
- In situ ellipsometry monitoring of TiO
atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H2O precursors on Si and In0.53Ga0.47As substrates
Publication Date: Available online 20 February 2021
E.V. Skopin, K. Abdukayumov, P. Abi Younes, M. Anikin, H. Roussel, J.-L. Deschanvres, H. Renevier
https://doi.org/10.1016/j.tsf.2021.138591
- The initiation of polymerization by organometallic compounds—V. The termination mechanism in the polymerization of acrylonitrile initiated by tetrakis(dimethylamido)titanium(IV)
Publication Date: Available online 1 May 2003
N.C. Billingham, L.M. Boxall, A.D. Jenkins, P.D. Lees
https://doi.org/10.1016/0014-3057(74)90039-1
- The initiation of polymerization by organometallic compounds—III: Kinetics of the polymerization of acrylonitrile by tetrakis(dimethylamido)titanium(IV)
Publication Date: Available online 17 April 2003
N.C. Billingham, L.M. Boxall, A.D. Jenkins